TGV (Through Glass Via) Fabrication

TGV
Conformal Cu TGV

Conformal Cu via

  • TGVs can play an important role in cost-effective advanced wafer packaging (2.5D&3D).

  • Glass has below advantages over silicon

    • High resistivity

    • Low electrical loss

    • Adjustable CTE (Better CTE match with organic package substrate than Silicon)

    • Low-frequency loss for RF applications (Low-loss tangent)

TGV
TGV Specs

We offer advanced TGV (Through Glass Via) microfabrication with

  • Precision diameters

    • Achieve diameters as small as 20µm

    • Capability to incorporate vias of varying diameters on the same substrate

    • Different diameters on opposite sides of the substrate are possible. (e.g., 30µm on one side and 60µm on the other).

  • Versatile Via Shapes:

    • Accommodates different via shapes based on diameter requirements, including hourglass, straight, and tapered designs

  • Substrate Size Flexibility:

    • Ranges from standard wafer sizes (100mm, 200mm, 300mm) to larger panel sizes (up to approximately 510x510mm)

  • Diverse glass types

    • Borosilicate glass, Soda lime glass, Fused silica (quartz), Sapphire, Non-alkaline glass.

  • Ultra-Thin Substrate Compatibility:

    • Support for substrates as thin as 50µm, enabling integration into compact and cutting-edge devices.

  • High Aspect Ratios:

    • Achievable aspect ratios up to 1:10, supporting high-density interconnections for advanced electronic applications.

  • Innovative TGV & BGV Fabrication:

    • Beyond TGV, we also fabricate blind glass vias (BGV), expanding the possibilities for your projects.

TGV-Cu

Cu filled (TGV) vias

We provide Through-Glass Vias (TGV) Copper filling and metallization services, utilizing advanced electroplating techniques to achieve high-quality results. The process begins with the deposition of a Titanium/Copper (Ti/Cu) seed layer within the vias. This crucial step ensures a solid foundation for the subsequent Copper (Cu) electroplating, allowing for either conformal coatings or complete, void-free via fills.

TGV Types

Completely filled Via

Conformal TGV

Conformal Via

We also provide other related services like glass thinning using wet etching or CMP, optical level polishing using CMP, Anodic bonding with Silicon wafers, thin film metallization, etc.

RDL(Redistributed Layers) for TGV glass substrate

TGV with Cu RDL

Both side RDL for TGV glass substrate can be possible.

Find more information here

TGV and RDL specs

Applications:

  • 2.5D & 3D packaging

  • MEMS

  • RF devices (RF MEMS switches)

  • High-performance computing

  • Display

  • Optoelectronics

  • Glass interposer

  • Cell culture

  • Wafer-level optics

  • Gas shower plate for ALD, CVD, Dry etching equipments

  • Microfluidics

  • Biomedical

  • Shadow mask: an alternative to metal masks