MEMS · Semiconductor · Nano-Fabrication

Pure-play Foundry Services
from Japan

Accelerate Your Innovation, From Small-Lot Prototype to Volume Production

Precision fabrication from Japan, accessible to the world.
From substrate to diced chip.

1–5
Wafer minimum
4 wks
Avg. turnaround
15
Process capabilities
300mm
Silicon wafer max
550×650mm
Max substrate, glass or film
Complete Fabrication Portfolio

Your end-to-end fabrication flow

Core Semiconductor Processes
Substrate
& Wafers
Si, Glass, SiC, GaN
2"–12" wafers + panels to 550×650mm
Design &
Mask
GDS, DXF, Chrome
CAD conversion · chrome-on-glass · metal masks
Photo-
lithography
20nm–4µm
E-beam · KrF stepper · mask aligner · glass panels
Nano-
imprinting
UV & thermal NIL
Sub-50nm · 500x600mm
Thin Film Deposition
Deposition
PVD, CVD, ALD
Metals · dielectrics · piezoelectrics
Liftoff
Patterning
Metal lift-off
Submicron · resist mold
Electro-
plating
Cu, Ni, Au, Sn
Wafer-level · electroforming · LIGA
Etching
DRIE, ICP-RIE, Wet
DRIE Bosch 35:1 AR · KOH/TMAH wet
Annealing
N2/H2/vacuum/RTA
Activation · to 1300C
Ion
Implant
Si, SiC, GaN
Wide dopant range · RTA to 1800°C
CMP &
Grinding
Planarization
Wafer thinning · surface preparation
Wafer
Cleaning
RCA · plasma · megasonic
Particle · oxide · organic
Dicing &
Packaging
Blade, laser, stealth
Individual chip packaging · carrier mount
Advanced Packaging & Integration
Wafer
Bonding
Cu-Cu, Eutectic
Hybrid · anodic · glass frit · ±1µm align
TSV
Fabrication
High AR, Cu fill
Void-free Cu · DRIE · CMP reveal
TSV
Reveal
Backgrind + CMP reveal
Expose Cu tips · carrier bond
TGV
Fabrication
10µm dia, panels
Borosilicate · fused silica · 730×920mm
RDL
Fabrication
Fan-in, Fan-out
FOWLP · Cu damascene · polymer passivation
Packaging
& Assembly
Wire bond, flip-chip
Die attach · singulation
3D/2.5D
Packaging
TSV+RDL+UBM+C4
CoWoS-style · ±1µm align
AuSn
Bump
PVD lift-off · fluxless
Eutectic 80/20 · III-V bonding
Biochip &
Microfluidics
Glass · Si · polymer
NIL · DRIE · anodic bond
SiPho
Packaging
TSV · RDL · UBM · C4
PIC backend · <200°C PECVD

View all 15+ processes and detailed specifications

Why Nanosystems JP Inc.

Japanese precision, global reach

🇯🇵

Japanese precision, global reach

Manufactured to exacting Japanese quality standards with experienced export logistics to all over the world.

Competitive lead times

4–11 weeks depending on process complexity, competitive with US and EU foundries.

🔒

IP-protected engagement

NDA available on request. All projects handled with full confidentiality.

👨‍🔬

Technical sales engineer access

Your inquiry is reviewed personally by technical sales and process engineers within 1 business day.

🧪

Custom process development

We work with your team to develop and optimize non-standard processes. From novel materials to unique stack requirements, if it can be done in a cleanroom, we can scope it.

🧩

Complex integration capability

Multi-process flows combining lithography, deposition, etching, bonding, and TSV in a single coordinated project, no hand-offs between vendors.

Fast response & flexibility

We deliver complex multi-process fabrication by integrating lithography, deposition, etching, bonding, and TSV within a single coordinated workflow.

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End-to-end integration

A complete workflow from substrate sourcing and mask fabrication to wafer processing, dicing, and global delivery coordinated under one project.

Advanced Packaging

Complete 3D Integration flow from DRIE to bumped wafer

Our TSV/TGV and advanced packaging capabilities cover the full fabrication sequence, supporting 3D IC integration, through-glass via interposers, and MEMS-CMOS stacking.

1
DRIE via etching, high-aspect-ratio silicon vias
2
Thermal oxidation + TiN/Cu barrier & seed deposition
3
Cu electroplating + annealing at ~400°C
4
Backgrinding to 50µm + TSV reveal by dry etch
5
SiN/SiO₂ CMP, planarised, ready-to-process surface
6
RDL formation + UBM deposition + C4 bump formation
Industries

Applications we serve

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Life Sciences & Diagnostics

Microfluidic chips, lab-on-chip, biosensors, DNA sequencing substrates, implantable MEMS.

📡

RF & Communications

GaAs/GaN HEMTs, RF MEMS switches, SAW/BAW filters, 5G components.

🤖

Robotics & Automation

MEMS accelerometers, gyroscopes, pressure sensors, tactile sensors.

🔋

Energy & Power

SiC/GaN power devices, energy harvesting MEMS, photovoltaic test structures.

🔭

Photonics & Imaging

Silicon photonics, LIDAR, optical MEMS, infrared detectors, metalens fabrication.

🚗

Automotive & Aerospace

High-reliability MEMS sensors, pressure transducers, inertial measurement units.

Engagement Process

From inquiry to chips

How to work with us

STEP 01

Send your inquiry

Email your project brief, process requirements, substrate, wafer size, quantities, and timeline. GDS/DXF files welcome but not required at this stage.

STEP 02

Technical review & quote

A process engineer reviews your design for compatibility and feasibility. You receive a detailed quote with process specs, timeline, and pricing within 7–10 business days.

STEP 03

NDA & order confirmation

Confirm process traveller and wafer specs. An NDA can be signed at this stage if preferred. Purchase order raised, fabrication is scheduled and begins.

STEP 04

Fabrication & QC

All processes executed with regular status updates. Wafers inspected with CD-SEM, optical, and electrical test. Full inspection report provided.

STEP 05

Dicing & packaging

Wafers diced to your specification. Individual chips packaged or mounted on carrier substrates per your requirements.

STEP 06

Worldwide delivery

Cleanroom-packaged, tracked international shipping to your door. Standard lead time of 4–8 weeks inquiry to delivery, depending on process complexity.

Start your project.
Response within 1 business day.

Share your process requirements, substrate, and production volume. A Nanosystems JP Inc. engineer will respond within 1 business day. Full quote typically within 7–10 business days, subject to project complexity and NDA requirements.

[email protected] · +81-3-5288-5569 · NDA available on request · Full quote within 7–10 business days · All data handled confidentially

Technical AI — Nanosystems JP Inc.
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